Electrochemically deposited molecular thin films on transparent conductive oxide substrate: combined DC and AC approaches for characterization

Transparent conductive oxides such as indium tin oxide (ITO) substrates are commonly employed prime materials for optoelectronic applications. Enhancement in functions of devices often compels stable and robust modification the ITO substrate to improve its interfacial charge transfer characteristics. Thereby, this work, naphthyl modifier multilayer films fabricated on using conventional electrochemical reduction 1-naphthyl diazonium salts (NAPH-D) via altering concentration ranging from 2 mM 12 with a step size 2. Surface coverage was significantly tuned by varying NAPH-D concentration, keeping other parameters number scans scan rate constant. For lower concentrations (2 mM), molecular thickness ∼6 nm obtained, whereas higher (12 mM) produced around 15–18 thickness. Atomic force microscopy (AFM), cyclic voltammetry, impedance spectroscopy (EIS) presence ferrocene redox probe also supports formation well packed film grown surface. Further, wettability property grafted investigated at different surface coverages correlated resistance (R Ct ) obtained EIS studies.